SPUTTER GAS-PRESSURE AND DC SUBSTRATE BIAS EFFECTS ON THICK RF-DIODE SPUTTERED FILMS OF TI OXYCARBIDES

被引：10

作者：

CARSON, WW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MECH & AEROSP ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.568685

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：845 / 849

页数：5

共 15 条

[1]

CARSON WAJ, TO BE PUBLISHED

[2]

CARSON WW, RFP1702 NTIS NAT TEC

[3]

CARSON WW, NSF HARD MATERIALS R, V2

[4]

CHRISTENSEN O, 1970, SOLID STATE TECHNOL, V13, P39

[5]

Glang LI, 1970, HDB THIN FILM TECHNO, P4

MAH, G ;

NORDIN, CW ;

FULLER, JF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :371-373

[7]

MAH G, 1972, SPUTTER COATING TITA

[8] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J].

MAISSEL, LI ;

SCHAIBLE, PM .

[9] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].

MATTOX, DM ;

KOMINIAK, GJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :528-&

SAWATZKY, E ;

KAY, E .