DEPOSITION OF DIAMOND-LIKE FILMS BY ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMAS

被引:36
作者
POOL, FS
SHING, YH
机构
[1] Jet Propulsion Laboratory, California Institute of Technology, Pasadena
关键词
D O I
10.1063/1.347094
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hard a-C:H films have been deposited through electron cyclotron resonance (ECR) microwave plasma decomposition of CH4 diluted with H 2 gas. It has been found that hard diamondlike films could only be produced under a rf-induced negative self-bias of the substrate stage. Raman spectra indicate the deposition of two distinct film types: one film type exhibiting well-defined bands at 1360 and 1580 cm-1 (the graphitic D and G bands) and another displaying a broad Raman peak centered at approximately 1500 cm-1. The optical gaps of these films are from 1.0 to 1.6 eV, respectively, with resistivities >1012 Ω cm. Variation of the mirror magnetic-field profile of the ECR system was examined, demonstrating the manipulation of film morphology through the extraction of different ion energies.
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页码:62 / 65
页数:4
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