FIELD EFFECT MEASUREMENT ON SILICON AND GERMANIUM WITH HIGH FREQUENCY CURRENT

被引:5
作者
GRAFE, W
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1971年 / 4卷 / 02期
关键词
D O I
10.1002/pssa.2210040210
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:369 / &
相关论文
共 6 条
[1]   THE EFFECTS OF DRIED O-2 ON THE SURFACE CONDUCTANCE OF SILICON [J].
EINSPRUCH, NG .
PHYSICA STATUS SOLIDI, 1962, 2 (02) :188-193
[2]   GROSSSIGNAL-FELDEFFEKT ZUR OBERFLACHENTERMBESTIMMUNG [J].
FLIETNER, H ;
GRAFE, W .
PHYSICA STATUS SOLIDI, 1966, 18 (01) :K5-&
[3]   EIGENSCHAFTEN GEWOHNLICHER HALBLEITEROBERFLACHEN [J].
FLIETNER, H .
PHYSICA STATUS SOLIDI, 1962, 2 (03) :221-281
[5]  
GRAFE W, IN PRESS
[6]   SOME MEASUREMENTS OF SURFACE PROPERTIES OF SILICON BY DC, AC AND PULSED FIELD EFFECTS [J].
MARATHE, BR .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1962, 79 (509) :503-&