ION EMISSION STUDIES OF PULSED-LASER EVAPORATION OF YBA2CU3O7

被引：13

作者：

LUNNEY, JG

LAWLER, JF

ARATARI, R

机构：

[1] Physics Department, Trinity College Dublin

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 74卷 / 06期

关键词：

D O I：

10.1063/1.354391

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasma formed by the laser ablation of YBa2Cu3O7 has been studied by comparing the ion dose incident on the growing film with the deposition depth per pulse. The variation of the deposition depth and ion velocity with laser fluence was also measured and compared with a physical model of the ablation process.

引用

页码：4277 / 4279

页数：3

共 7 条

[1] SECONDARY ELECTRONS GENERATED BY FAST NEUTRAL BOMBARDMENT OF THE GROWING FILM DURING LASER ABLATION DEPOSITION [J].