INVESTIGATION OF REACTIVELY SPUTTERED TUNGSTEN NITRIDE AS HIGH-TEMPERATURE STABLE SCHOTTKY CONTACTS TO GAAS

被引：20

作者：

GEISSBERGER, AE

SADLER, RA

LEYENAAR, FA

BALZAN, ML

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.573634

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：3091 / 3094

页数：4

相关论文

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