OPTICAL STUDY OF NIOBIUM DISILICIDE POLYCRYSTALLINE FILMS

被引：2

作者：

AMIOTTI, M ^{[1
]}

BORGHESI, A ^{[1
]}

MARABELLI, F ^{[1
]}

GUIZZETTI, G ^{[1
]}

NAVA, F ^{[1
]}

机构：

[1] UNIV MODENA,DIPARTMENTO FIS,I-41100 MODENA,ITALY

来源：

PHYSICAL REVIEW B | 1991年 / 44卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.44.3757

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

NbSi2 polycrystalline films, coevaporated and thermally annealed, were subjected to chemical and structural characterization, and then studied by reflectance from 0.06 to 6 eV and ellipsometry from 1.4 to 5 eV. The dielectric functions, obtained from Kramers-Kronig analysis and directly from ellipsometry, are also presented. Low-frequency free-carrier response is discussed in terms of the Drude model; the high-frequency interband structures are interpreted on the basis of the calculated density of states and photoemission results. A comparison is made with the optical properties of isoelectronic VSi2 and TaSi2 Polycrystalline films.

引用

页码：3757 / 3761

页数：5

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