PARTIAL EPITAXIAL-GROWTH OF NBSI2 ON SI(111)

被引：7

作者：

CHANG, CS

NIEH, CW

CHU, JJ

CHEN, LJ

机构：

来源：

THIN SOLID FILMS | 1988年 / 161卷

关键词：

D O I：

10.1016/0040-6090(88)90258-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：263 / 271

页数：9

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