GROWTH-KINETICS AND GROWTH MECHANISMS FOR DISILICIDE LAYERS OBTAINED THROUGH IMPLANTATION

被引:16
作者
DHEURLE, FM
PETERSSON, CS
TSAI, MY
机构
[1] IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598, United States
关键词
Compendex;
D O I
10.1063/1.330478
中图分类号
O59 [应用物理学];
学科分类号
摘要
42
引用
收藏
页码:8765 / 8770
页数:6
相关论文
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