OXIDATION OF AN ALUMINUM MAGNETRON SPUTTERING TARGET IN AR-O2 MIXTURES

[11] MOTT NF, 1946, J I MET, V72, P367

[12] PULVERIZATION AND DEPTH DISTRIBUTION .4. CATHODE PULVERIZATION OF NB205, TA205 AND WO3 OXIDES [J]. CANADIAN JOURNAL OF PHYSICS, 1970, 48 (02) : 137 - &

[13] Pilling NB, 1923, J I MET, V29, P529

[14] Samsonov G. V., 1968, HDB PHYSICOCHEMICAL, P250

[15] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[16] OXIDATION OF ALUMINUM IN THE TEMPERATURE RANGE 400-DEGREES-C-600-DEGREES-C [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1956, 103 (04) : 209 - 214

[17] SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM [J]. THIN SOLID FILMS, 1971, 7 (01) : 1 - &

[18] TOULOUKIAN YS, 1967, THERMOPHYSICAL PROPE, V4, P3

[19] VANVOROUS T, 1976, SOLID STATE TECHNOL, V19, P62

[20] Wagner C, 1938, Z PHYS CHEM B-CHEM E, V40, P455

[11] MOTT NF, 1946, J I MET, V72, P367

[12] PULVERIZATION AND DEPTH DISTRIBUTION .4. CATHODE PULVERIZATION OF NB205, TA205 AND WO3 OXIDES [J]. CANADIAN JOURNAL OF PHYSICS, 1970, 48 (02) : 137 - &

[13] Pilling NB, 1923, J I MET, V29, P529

[14] Samsonov G. V., 1968, HDB PHYSICOCHEMICAL, P250

[15] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[16] OXIDATION OF ALUMINUM IN THE TEMPERATURE RANGE 400-DEGREES-C-600-DEGREES-C [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1956, 103 (04) : 209 - 214

[17] SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM [J]. THIN SOLID FILMS, 1971, 7 (01) : 1 - &

[18] TOULOUKIAN YS, 1967, THERMOPHYSICAL PROPE, V4, P3

[19] VANVOROUS T, 1976, SOLID STATE TECHNOL, V19, P62

[20] Wagner C, 1938, Z PHYS CHEM B-CHEM E, V40, P455