FOURIER-TRANSFORM INFRARED STUDY OF RAPID THERMAL ANNEALING OF A-SI-N-H(D) FILMS PREPARED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

被引：71

作者：

LU, Z

SANTOS, P

STEVENS, G

WILLIAMS, MJ

LUCOVSKY, G

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

[2] N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579794

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：607 / 613

页数：7

共 14 条

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