STRUCTURAL CHARACTERIZATION OF TRANSPARENT SEMICONDUCTING THIN-FILMS OF SNO2 AND IN2O3

被引:29
作者
MAMMANA, AP
BRAGA, ES
TORRIANI, I
ANDERSON, RL
机构
[1] UNIV ESTADUAL CAMPINAS,INST FIS,BR-13100 CAMPINAS,BRAZIL
[2] UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405
关键词
D O I
10.1016/0040-6090(81)90149-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:355 / 359
页数:5
相关论文
共 4 条
[1]   PLASMA-ETCHING OF SNO2 FILMS ON SILICON SUBSTRATES [J].
BRAGA, ES ;
MAMMANA, AP ;
MAMMANA, CIZ ;
ANDERSON, RL .
THIN SOLID FILMS, 1980, 73 (02) :L5-L6
[2]   STUDY OF FILMS HAVING BASE OF TIN OXIDE AND INDIUM OXIDE BY MEANS OF X-RAY-DIFFRACTION [J].
HECQ, M ;
DUBOIS, A ;
VANCAKEN.J .
THIN SOLID FILMS, 1973, 18 (01) :117-125
[3]  
MAMMANA AP, 1980, 7TH P SEM INT SOFTW, P285
[4]  
MAMMANA AP, 1980, 7TH P SEM INT SOFTW, P158