SPUTTERING OF ANNEALED ALUMINUM AND OF SINTERED ALUMINUM POWDER (SAP 895) UNDER D+ AND 4HE+ BOMBARDMENT - STUDY OF MICROSTRUCTURAL EFFECTS

被引:4
作者
LAM, SK
KAMINSKY, M
机构
关键词
D O I
10.1016/0022-3115(80)90056-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:205 / 220
页数:16
相关论文
共 32 条
[21]  
KAMINSKY M, UNPUBLISHED
[22]   X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF NICKEL-OXYGEN SURFACES USING OXYGEN AND ARGON ION-BOMBARDMENT [J].
KIM, KS ;
WINOGRAD, N .
SURFACE SCIENCE, 1974, 43 (02) :625-643
[23]  
LAM SK, 1979, 1ST TOP M FUS REACT
[24]  
LITTMARK V, 1978, J MATER SCI, V13, P2577
[25]  
MATHIEU HJ, 1977, 7TH P INT VAC C 3RD, P2023
[26]  
ROTH J, 1979, IPP926 MAX PLANCK I
[27]   PHYSICAL SPUTTERING MODEL FOR FUSION REACTOR 1ST-WALL MATERIALS [J].
SMITH, DL .
JOURNAL OF NUCLEAR MATERIALS, 1978, 75 (01) :20-31
[28]   SPUTTERING MEASUREMENTS ON CONTROLLED THERMONUCLEAR REACTOR MATERIALS USING AUGER-ELECTRON SPECTROSCOPY [J].
SMITH, JN ;
MEYER, CH ;
LAYTON, JK .
NUCLEAR TECHNOLOGY, 1976, 29 (03) :318-321
[29]   AES CHARACTERIZATION OF OXIDIZED FILMS OF MG, AL, AND SI [J].
STRAUSSER, YE ;
JOHANNESSEN, JS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :48-49
[30]  
TOWNSEND PD, 1976, ION IMPLANTATION SPU