MICROSTRUCTURE OF BORON-DOPED SILICON LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：9

作者：

BIELLEDASPET, D

MANSOURBAHLOUI, F

MARTINEZ, A

PIERAGGI, B

DAVID, MJ

DEMAUDUIT, B

OUSTRY, A

CARLES, R

LANDA, G

AJUSTRON, F

MAZEL, A

RIBOULET, P

机构：

[1] ECOLE NATL SUPER CHIM TOULOUSE,LMP,F-31062 TOULOUSE,FRANCE

[2] UNIV TOULOUSE 3,LMSM,F-31062 TOULOUSE,FRANCE

[3] UNIV TOULOUSE 3,PHYSICOCHIM SOCIOES LAB,F-31062 TOULOUSE,FRANCE

[4] LAB OPT ELECTR,F-31055 TOULOUSE,FRANCE

[5] OFF NATL ETUD & RECH AEROSP,CTR ETUD & RECH TOULOUSE,F-31055 TOULOUSE,FRANCE

来源：

关键词：

D O I：

10.1016/0040-6090(87)90309-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：69 / 82

页数：14

共 11 条

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