CORRELATION OF CHEMICAL AND ELECTRICAL-PROPERTIES OF PLASMA-DEPOSITED TETRAMETHYLSILANE FILMS

被引：36

作者：

SZETO, R

HESS, DW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 02期

关键词：

D O I：

10.1063/1.328774

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：903 / 908

页数：6

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