OPTICAL STUDY OF MICROVOIDS, VOIDS, AND LOCAL INHOMOGENEITIES IN AMORPHOUS-SILICON

被引:18
作者
VANECEK, M
HOLOUBEK, J
SHAH, A
机构
[1] CZECHOSLOVAK ACAD SCI, INST MACROMOLEC CHEM, CS-16206 PRAGUE 6, CZECHOSLOVAKIA
[2] UNIV NEUCHATEL, INST MICROTECHNOL, CH-2000 NEUCHATEL, SWITZERLAND
关键词
D O I
10.1063/1.106081
中图分类号
O59 [应用物理学];
学科分类号
摘要
Elastic light scattering has been used for a study of microstructure in amorphous hydrogenated silicon. A simple theory to get quantitative informations on the microstructure has been presented for the first time, both for Rayleigh and Mie scattering. For optimal very high frequency glow discharge amorphous silicon layers, the presence of voids with diameter between 1 and 20 nm is typical.
引用
收藏
页码:2237 / 2239
页数:3
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