THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .4. ION-SOURCE MODIFICATION

被引：12

作者：

AMANO, J ^{[1
]}

LAWSON, RPW ^{[1
]}

机构：

[1] UNIV ALBERTA,DEPT ELECT ENGN,EDMONTON T6G 2M7,ALBERTA,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 01期

关键词：

D O I：

10.1116/1.569418

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：118 / 119

页数：2

共 4 条

[1] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS
AMANO, J
LAWSON, RPW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03): : 831 - 835
[2] AMANO J, 1977, J VAC SCI TECHNOL, V14, P836, DOI 10.1116/1.569281
[3] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN
AMANO, J
BRYCE, P
LAWSON, RPW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02): : 591 - 595
[4] HIGH INTENSITY LOW ENERGY SPREAD ION SOURCE FOR CHEMICAL ACCELERATORS
MENZINGER, M
WAHLIN, L
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01) : 102 - +