FILM THICKNESS DISTRIBUTION IN MAGNETRON SPUTTERING

被引：61

作者：

SWANN, S

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(88)90465-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：791 / 794

页数：4

共 9 条

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[5]

DEPPISCH G, 1981, VAKUUM-TECH, V30, P67

[6]

Holland L., 1963, VACUUM DEPOSITION TH

[7] SPATIAL-DISTRIBUTION OF SPUTTERED ATOMS FROM MAGNETRON SOURCE [J].

SWANN, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1750-1754

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[9]

1987, MASK SOFTWARE