X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THE O 1-S STATE ON THE SURFACE OF DUAL ION-BEAM DEPOSITED ZROX FILMS

被引：7

作者：

TANG, YS ^{[1
]}

HUANG, NK ^{[1
]}

机构：

[1] SICHUAN UNIV,INST NUCL SCI & TECHNOL,CHENGDU,PEOPLES R CHINA

来源：

SOLID STATE COMMUNICATIONS | 1991年 / 77卷 / 05期

关键词：

D O I：

10.1016/0038-1098(91)90746-I

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The O 1s state on the surface of dual ion beam deposited ZrOx films were studied by using x-ray photoelectron spectroscopy. Different from the bulk of the films, it was found that a new O 1s peak exists on the surface, which is assigned to be due to the existence of carbon contamination.

引用

页码：341 / 343

页数：3

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