GAIN STUDIES OF ELECTRON-BEAM EXCITED XEF LASER MIXTURES

[1] BERGER MJ, N651206 NASA REP

[2] 354-NM LASER ACTION ON XEF [J]. APPLIED PHYSICS LETTERS, 1975, 27 (08) : 435 - 437

[3] INFLUENCE OF DILUENT GAS ON XEF LASER [J]. APPLIED PHYSICS LETTERS, 1977, 31 (08) : 513 - 515

[4] TEMPERATURE-DEPENDENT ABSORPTION PROCESSES IN THE XEF LASER [J]. APPLIED PHYSICS LETTERS, 1979, 35 (07) : 516 - 519

[5] CHAMPAGNE LF, 1977, APPL PHYS LETT, V30, P60

[6] NEW ELECTRON-BEAM PUMPED XEF-LASER AT 486-NM [J]. APPLIED PHYSICS LETTERS, 1979, 35 (01) : 36 - 37

[7] GAIN CONDITIONS FOR ELECTRON-BEAM-EXCITED AR-N2 LASER LINES AT 337.1, 357.7, AND 380.5 NM [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) : 3879 - 3883

[8] ERNST WE, TOPICAL M EXCIMER LA

[9] ERNST WE, 1980, J APPL PHYS MAY

[10] HART G, 1975, ARPANRL TECH REP

[1] BERGER MJ, N651206 NASA REP

[2] 354-NM LASER ACTION ON XEF [J]. APPLIED PHYSICS LETTERS, 1975, 27 (08) : 435 - 437

[3] INFLUENCE OF DILUENT GAS ON XEF LASER [J]. APPLIED PHYSICS LETTERS, 1977, 31 (08) : 513 - 515

[4] TEMPERATURE-DEPENDENT ABSORPTION PROCESSES IN THE XEF LASER [J]. APPLIED PHYSICS LETTERS, 1979, 35 (07) : 516 - 519

[5] CHAMPAGNE LF, 1977, APPL PHYS LETT, V30, P60

[6] NEW ELECTRON-BEAM PUMPED XEF-LASER AT 486-NM [J]. APPLIED PHYSICS LETTERS, 1979, 35 (01) : 36 - 37

[7] GAIN CONDITIONS FOR ELECTRON-BEAM-EXCITED AR-N2 LASER LINES AT 337.1, 357.7, AND 380.5 NM [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) : 3879 - 3883

[8] ERNST WE, TOPICAL M EXCIMER LA

[9] ERNST WE, 1980, J APPL PHYS MAY

[10] HART G, 1975, ARPANRL TECH REP