AXIAL DISTRIBUTION OF OPTICAL-EMISSION IN A PLANAR MAGNETRON DISCHARGE

被引：70

作者：

GU, L ^{[1
]}

LIEBERMAN, MA ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.575460

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2960 / 2964

页数：5

共 7 条

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UENO, H
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[2] ROSSANGL SM, 1986, J VAC SCI TECHNOL A, V4, P1882
[3] INDUCED DRIFT CURRENTS IN CIRCULAR PLANAR MAGNETRONS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (01): : 88 - 91
[4] MAGNETRON SPUTTERING - BASIC PHYSICS AND APPLICATION TO CYLINDRICAL MAGNETRONS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 171 - 177
[5] THORNTON JA, 1978, THIN FILM PROCESSES, P76
[6] Waits R.K., 1978, THIN FILM PROCESSES, p[24, 131]
[7] RADIAL CURRENT DISTRIBUTION AT A PLANAR MAGNETRON CATHODE
WENDT, AE
LIEBERMAN, MA
MEUTH, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1827 - 1831