PLASMA PRODUCTION WITH DC DISCHARGE PLANAR MAGNETRON DEVICE FOR THIN-FILM PREPARATION

被引：23

作者：

FUJITA, H ^{[1
]}

YAGURA, S ^{[1
]}

UENO, H ^{[1
]}

NAGANO, M ^{[1
]}

机构：

[1] SAGA UNIV,DEPT IND CHEM,SAGA 840,JAPAN

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1986年 / 19卷 / 09期

关键词：

CHEMICAL VAPOR DEPOSITION;

D O I：

10.1088/0022-3727/19/9/014

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1699 / 1706

页数：8

共 16 条

[1]

BOENING HV, 1984, ADV LOW TEMPERATURE

[2] HIGH-RATE PLANAR MAGNETRON DEPOSITION OF TRANSPARENT, CONDUCTING, AND HEAT REFLECTING FILMS ON GLASS AND PLASTIC [J].

BRETT, MJ ;

MCMAHON, RW ;

AFFINITO, J ;

PARSONS, RR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :352-355

[3]

Chen F F, 1965, PLASMA DIAGNOSTIC TE

[4]

Cherrington B., 1982, PLASMA CHEM PLASMA P, V2, P113, DOI [10.1007/BF00633129, DOI 10.1007/BF00633129]

[5]

FUJITA H, 1984, PLASMA PHYS CONTR F, V26, P1083, DOI 10.1088/0741-3335/26/9/004

[6] ELECTRICAL-PROPERTIES OF HIGHLY CONDUCTING AND TRANSPARENT THIN-FILMS OF MAGNETRON SPUTTERED SNO2 [J].

GOODCHILD, RG ;

WEBB, JB ;

WILLIAMS, DF .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) :2308-2310

[7] NEGATIVE PLASMA POTENTIALS PRODUCED BY SUPPLEMENTAL ELECTRON-EMISSION [J].

HERSHKOWITZ, N ;

ZE, F ;

KOZIMA, H .

PHYSICS OF FLUIDS, 1979, 22 (02) :338-346

[8] DEPOSITION OF TRANSPARENT HEAT-REFLECTING COATINGS OF METAL-OXIDES USING REACTIVE PLANAR MAGNETRON SPUTTERING OF A METAL AND-OR ALLOY [J].

HOWSON, RP ;

RIDGE, MI .

THIN SOLID FILMS, 1981, 77 (1-3) :119-125

[9] ION-BURST EXCITED BY A GRID IN A PLASMA [J].

IKEZI, H ;

TAYLOR, RJ .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) :738-&

[10]

KEMP RF, 1966, REV SCI INSTRUM, V37, P1318

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