Liquid Phase Deposition of Amorphous Carbon and Carbon Nitride Films

被引：2

作者：

Kiyota, Hideo ^{[1
]}

Gamo, Hidenori ^{[2
]}

Nishitani-Gamo, Mikka ^{[3
,4
]}

Ando, Toshihiro ^{[5
]}

机构：

[1] Tokai Univ, Sch Ind Engn, Dept Mech Syst Engn, 9-1-1 Toroku, Kumamoto 8628652, Japan

[2] Toppan Printing Co Ltd, Tech Res Inst, Sugito, Saitama 3458508, Japan

[3] Toyo Univ, Dept Appl Chem, Kawagoe, Saitama 3508585, Japan

[4] Toyo Univ, Sensor Photon Res Ctr, Kawagoe, Saitama 3508585, Japan

[5] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan

来源：

E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2009年 / 7卷

关键词：

Carbon; Amorphous thin films; Electrochemical methods; Growth; Field emission; Carbon nitride;

D O I：

10.1380/ejssnt.2009.102

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Liquid phase deposition of amorphous carbon (a-C) and carbon nitride (CNx) film has been attempted by means of electrolysis of organic liquids. The deposition of a-C film is achieved by applying a DC bias voltage to substrate immersed in methanol. Smooth and homogeneous a-C films are deposited on specific substrate materials such as Si, Ti, and Al. The deposition of CNx films are carried out by using nitrogen-containing electrolyte such as acrylonitrile (CH2CHCN). Continuous and uniform films are obtained with the application of both negative and positive bias voltages. The atomic ratios of nitrogen to carbon in the grown films are estimated as 0.16-0.28. Those results demonstrate the feasibility of using liquid deposition techniques for the production of carbon related materials.

引用

页码：102 / 106

页数：5

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