OPTICAL ABSORPTIVITY OF ION-BEAM IRRADIATED SILICON

被引：10

作者：

BHATIA, KL

KRATSCHMER, W

KALBITZER, S

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 01期

关键词：

D O I：

10.1007/BF00618765

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：69 / 72

页数：4

共 14 条

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