THERMODYNAMIC INVESTIGATION OF SELECTIVE TUNGSTEN CHEMICAL VAPOR-DEPOSITION - INFLUENCE OF GROWTH-CONDITIONS AND GAS ADDITIVES ON THE SELECTIVITY IN THE FLUORIDE PROCESS

被引：13

作者：

CARLSSON, JO

HARSTA, A

机构：

[1] Univ of Uppsala, Uppsala, Swed, Univ of Uppsala, Uppsala, Swed

来源：

THIN SOLID FILMS | 1988年 / 158卷 / 01期

关键词：

The financial support of this project by the Swedish Board for Technical Development and the Swedish Natural Science Research Council is gratefully acknowledged;

D O I：

10.1016/0040-6090(88)90307-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：107 / 122

页数：16

共 15 条

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[8]

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[9] SELECTIVE LPCVD TUNGSTEN FOR CONTACT BARRIER APPLICATIONS [J].

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ALI, YS .

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[10]

NOLANG B, 1983, THESIS U UPS, P691

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