COMPACT ECR-SOURCE OF IONS AND RADICALS FOR SEMICONDUCTOR SURFACE-TREATMENT

被引：12

作者：

SHAPOVAL, SY

BULKIN, PV

CHUMAKOV, AA

KHUDOBIN, SA

MAXIMOV, I

MIKHAILOV, GM

机构：

[1] Institute of Microelectronics Technology and High Purity Materials, USSR Academy of Sciences, Chernogolovka

来源：

VACUUM | 1992年 / 43卷 / 03期

关键词：

D O I：

10.1016/0042-207X(92)90260-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A compact microwave ECR-source of ions and free radicals has been fabricated. It includes a stainless steel tube, ceramic microwave input and permanent SmCo5 ring-shaped magnets. Its working pressure range is 10(-4)-10(-2) torr using Ar, H-2, N2 and some other gases. The maximum ion current density in a hydrogen discharge at 10(-3) torr reaches 3 mA cm-2 15 cm downstream with a microwave power and plasma stream diameter of 100 W and 8 cm, respectively.

引用

页码：195 / 197

页数：3

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