ION ENERGY-DISTRIBUTIONS IN AN RF-DC-TRIODE GLOW-DISCHARGE

被引：5

作者：

ZEUNER, M

MEICHSNER, J

机构：

[1] Technische Universität Chemnitz-Zwickau, Institut für Physik

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-5卷 / 1-3期

关键词：

ION ENERGY DISTRIBUTION; GLOW DISCHARGE;

D O I：

10.1016/0257-8972(95)08330-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ion kinetic investigations are performed on a 13.56 MHz r.f.-d.c.-triode discharge using argon as the process gas. The incident ions on the grounded electrode are separated, according to their mass and energy, and the influence of total pressure and d.c. voltage on the ion energy distribution, the discharge potential conditions and the plasma sheath thickness are discussed.

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收藏

页码：562 / 566

页数：5

相关论文

共 15 条

[1]

BIEHLER S, 1991, THESIS RUHR U BOCHUM

[2] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING [J].

COBURN, JW ;

KAY, E .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) :4965-4971

[3] ION ENERGY-DISTRIBUTIONS IN RADIOFREQUENCY DISCHARGES [J].

FIELD, D ;

KLEMPERER, DF ;

MAY, PW ;

SONG, YP .

JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :82-92

[4] ION ENERGY-DISTRIBUTIONS ON SURFACES EXPOSED TO PLASMAS - AN EXPERIMENTAL AND THEORETICAL INVESTIGATION [J].

HEIM, D ;

STORI, H .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (08) :3330-3340

[5] SHEATH COLLISION PROCESSES CONTROLLING THE ENERGY AND DIRECTIONALITY OF SURFACE BOMBARDMENT IN O-2 REACTIVE ION ETCHING [J].

JURGENSEN, CW .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (02) :590-597

[6]

KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396

[7] DISTRIBUTION OF ION ENERGIES INCIDENT ON ELECTRODES IN CAPACITIVELY COUPLED RF DISCHARGES [J].

KUSHNER, MJ .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4024-4031

[8] MEASUREMENT OF ION ENERGY-DISTRIBUTIONS AT THE POWERED RF ELECTRODE IN A VARIABLE MAGNETIC-FIELD [J].

KUYPERS, AD ;

HOPMAN, HJ .

JOURNAL OF APPLIED PHYSICS, 1990, 67 (03) :1229-1240

[9] ION-BOMBARDMENT IN RF-PLASMAS [J].

LIU, J ;

HUPPERT, GL ;

SAWIN, HH .

JOURNAL OF APPLIED PHYSICS, 1990, 68 (08) :3916-3934

[10] MEASUREMENT OF ION IMPACT ENERGY AND ION FLUX AT THE RF ELECTRODE OF A PARALLEL PLATE REACTIVE ION ETCHER [J].

MANENSCHIJN, A ;

JANSSEN, GCAM ;

VANDERDRIFT, E ;

RADELAAR, S .

JOURNAL OF APPLIED PHYSICS, 1991, 69 (03) :1253-1262