ATOMIC-FORCE MICROSCOPY STUDY OF TITANIUM-DIOXIDE THIN-FILMS GROWN BY ATOMIC LAYER EPITAXY

被引：87

作者：

RITALA, M

LESKELA, M

JOHANSSON, LS

NIINISTO, L

机构：

[1] UNIV TURKU,DEPT APPL PHYS,SF-20500 TURKU 50,FINLAND

[2] HELSINKI UNIV TECHNOL,INORGAN & ANALYT CHEM LAB,SF-02150 ESPOO 15,FINLAND

来源：

THIN SOLID FILMS | 1993年 / 228卷 / 1-2期

基金：

芬兰科学院;

关键词：

D O I：

10.1016/0040-6090(93)90557-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Atomic force microscopy was used to study the morphological development of TiO2 thin films deposited on mica and soda-lime substrates by atomic layer epitaxy using TiCl4 and water as reactants. TiO2 was observed to agglomerate, causing increasing surface roughening with increasing number of deposition cycles. The reasons for the agglomeration are discussed.

引用

页码：32 / 35

页数：4

共 8 条

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