STRESSES IN HETEROEPITAXIAL LAYERS - GAAS1-XPX ON GAAS

A model is presented showing that there is a previously unrecognized source of stress in epitaxially grown heterojunction structures, specifically caused by a set of inclined dislocations formed by misfit dislocations which turn upwards at the heterojunction. This stress is indirectly related to the lattice mismatch at the heterojunction. For small lattice mismatch, the inclined dislocations are in an ordered array and cause the layer to bend upon removal from the substrate. For large lattice mismatch, the inclined dislocations are random so that there are only localized stresses and no net bending stress. A series of heterojunctions of GaAs1-xPx vapor grown onto GaAs were prepared, and the GaAs1-xPx constant-composition layers were removed from the substrate. The bending of the layers observed and the dislocation morphologies revealed in the layers by transmission electron microscopy, demonstrate the validity of the above model. In GaAs 0.8P0.2 grown on GaAs, the stress due to lattice mismatch exceeds that due to differential thermal contraction. © 1969 The American Institute of Physics.