EPITAXIAL SRTIO3 THIN-FILMS GROWN BY ARF EXCIMER LASER DEPOSITION

被引:29
作者
HIRANO, T [1 ]
FUJII, T [1 ]
FUJINO, K [1 ]
SAKUTA, K [1 ]
KOBAYASHI, T [1 ]
机构
[1] NIPPON SHEET GLASS CO LTD,RES LAB,ITAMI,HYOGO 664,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 4B期
关键词
SRTIO3; ARF EXCIMER LASER DEPOSITION; NATURAL ORIENTATION; FLUCTUATING; EPITAXIAL GROWTH; INSULATING PROPERTY; RELATIVE DIELECTRIC CONSTANT;
D O I
10.1143/JJAP.31.L511
中图分类号
O59 [应用物理学];
学科分类号
摘要
SrTiO3 (STO) thin films were prepared by an ArF excimer laser deposition method. At the growth temperature of 630-degrees-C, the natural orientation of STO was significantly changed from (111) to (100) and (110). The ratio of X-ray diffraction intensities (100)/(200) was closest to the ideal value when grown at 660-degrees-C, resulting in minimized disorder of atomic arrangement. Epitaxial STO films were obtained on STO(100) and MgO(100) substrates, and on an YBaCuO(001) epitaxial film. They showed resistivity in excess of 5 x 10(10) OMEGA-cm and dielectric constant as high as 140-epsilon-0 at room temperature. The maximum dielectric constant of 440-epsilon-0 was obtained at 40 K.
引用
收藏
页码:L511 / L514
页数:4
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