ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING - EXPERIMENT

被引：54

作者：

HAWRYLUK, RJ

SMITH, HI

SOARES, A

HAWRYLUK, AM

机构：

[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173

[2] MIT,DEPT PHYS,CAMBRIDGE,MA 02139

[3] MIT,DEPT ELECT ENGN,CAMBRIDGE,MA 01239

来源：

关键词：

D O I：

10.1063/1.321929

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2528 / 2537

页数：10

共 23 条

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[3] MODEL FOR EXPOSURE OF ELECTRON-SENSITIVE RESISTS
GREENEICH, JS
VANDUZER, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1056 - 1059
[4] EXPOSURE MODEL FOR ELECTRON-SENSITIVE RESISTS
GREENEICH, JS
VANDUZER, T
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (05) : 286 - 299
[5] GREENEICH JS, 1973, THESIS U CALIFORNIA
[6] Griem H. R., 1964, PLASMA SPECTROSCOPY, P176
[7] HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337
[8] HATZAKIS M, 1971, APPL PHYS LETT, V8, P7
[9] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING
HAWRYLUK, RJ
HAWRYLUK, AM
SMITH, HI
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) : 2551 - 2566
[10] HAWRYLUK RJ, 1974, 6TH P INT C EL ION B, P87