UHV MICROSCOPY OF SURFACES

被引：5

作者：

AI, R

BUCKETT, MI

DUNN, D

SAVAGE, TS

ZHANG, JP

MARKS, LD

机构：

[1] Center for Surface Radiation Damage Studies, Department of Materials Science and Engineering, Northwestern University, Evanston

来源：

ULTRAMICROSCOPY | 1991年 / 39卷 / 1-4期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0304-3991(91)90219-V

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5 x 20 reconstruction and the boron-doped Si(111)square-root 3 x square-root 3 R30-degrees reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1 x 10(-7) Torr of CO are described which illustrate the critical role of background gases in electron microscopy.

引用

页码：387 / 394

页数：8

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