A NOVEL ANISOTROPIC DRY ETCHING TECHNIQUE

[1] BOSCH MA, 1981, APPL PHYS LETT, V38, P264, DOI 10.1063/1.92338

[2] ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3189 - 3196

[3] COBURN JW, 1972, J APPL PHYS, V43, P4962

[4] DIRECTIONAL OXYGEN-ION-BEAM ETCHING OF CARBONACEOUS MATERIALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1906 - 1908

[5] MUESEMANN B, 1979, J VAC SCI TECHNOL, V16, P1886

[1] BOSCH MA, 1981, APPL PHYS LETT, V38, P264, DOI 10.1063/1.92338

[2] ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3189 - 3196

[3] COBURN JW, 1972, J APPL PHYS, V43, P4962

[4] DIRECTIONAL OXYGEN-ION-BEAM ETCHING OF CARBONACEOUS MATERIALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1906 - 1908

[5] MUESEMANN B, 1979, J VAC SCI TECHNOL, V16, P1886