ANALYSIS AND CONTROL OF FLOATING-BODY BIPOLAR EFFECTS IN FULLY DEPLETED SUBMICROMETER SOI MOSFETS

被引:191
作者
CHOI, JY
FOSSUM, JG
机构
[1] Department of Electrical Engineering, University of Florida, Gainesville, FL
关键词
D O I
10.1109/16.81630
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Floating-body effects triggered by impact ionization in fully depleted submicrometer SOI MOSFET's are analyzed based on two-dimensional device simulations. The parasitic bipolar junction transistor (BJT) effects are emphasized, but the kink effect and its disappearance in the fully depleted device are first explained physically to provide a basis for the BJT analysis. Copious simulations of the BJT-induced breakdown and latch phenomena are done, and parametric dependences are examined to give physical insight for optimal design. The analysis further relates the dc breakdown and latch mechanisms in the fully depleted submicrometer SOI MOSFET to actual BJT-related problems in an operating SOI CMOS circuit. A comprehensive understanding of the floating-body effects is attained, and a device design to control them utilizing a lightly doped source (LDS) is suggested and shown to be feasible.
引用
收藏
页码:1384 / 1391
页数:8
相关论文
共 12 条
  • [1] SINGLE-TRANSISTOR LATCH IN SOI MOSFETS
    CHEN, CED
    MATLOUBIAN, M
    SUNDARESAN, R
    MAO, BY
    WEI, CC
    POLLACK, GP
    [J]. IEEE ELECTRON DEVICE LETTERS, 1988, 9 (12) : 636 - 638
  • [2] CHOI JY, 1989, P IEEE SOS SOI TECHN, P23
  • [3] REDUCTION OF KINK EFFECT IN THIN-FILM SOI MOSFETS
    COLINGE, JP
    [J]. IEEE ELECTRON DEVICE LETTERS, 1988, 9 (02) : 97 - 99
  • [4] SOI DESIGN FOR COMPETITIVE CMOS VLSI
    FOSSUM, JG
    CHOI, JY
    SUNDARESAN, R
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (03) : 724 - 729
  • [5] AN ANALYTIC MODEL FOR MINORITY-CARRIER TRANSPORT IN HEAVILY DOPED REGIONS OF SILICON DEVICES
    FOSSUM, JG
    SHIBIB, MA
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (09) : 1018 - 1025
  • [6] ANALYSIS OF KINK CHARACTERISTICS IN SILICON-ON-INSULATOR MOSFETS USING 2-CARRIER MODELING
    KATO, K
    WADA, T
    TANIGUCHI, K
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) : 458 - 462
  • [7] LIM HK, 1985, IEEE T ELECTRON DEV, V32, P446
  • [8] MCKITTERICK M, 1989, P IEEE SOS SOI TECHN, P17
  • [9] VEEERARAGHAVAN S, 1988, IEEE T ELECTRON DEV, V35, P1866
  • [10] SHORT-CHANNEL EFFECTS IN SOI MOSFETS
    VEERARAGHAVAN, S
    FOSSUM, JG
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (03) : 522 - 528