SELF-DIFFUSION OF SILICON IN THIN-FILMS OF COBALT, NICKEL, PALLADIUM AND PLATINUM SILICIDES

被引：8

作者：

BOTHA, AP

KRITZINGER, S

PRETORIUS, R

机构：

[1] UNIV STELLENBOSCH,DEPT PHYS,DIV SOLID STATE,STELLENBOSCH 7600,SOUTH AFRICA

[2] CSIR,NATL ACCELERATOR CTR,VANDEGRAAFF GRP,FAURE 7131,SOUTH AFRICA

来源：

THIN SOLID FILMS | 1986年 / 141卷 / 01期

关键词：

D O I：

10.1016/0040-6090(86)90317-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：41 / 51

页数：11

共 24 条

[1]

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BOTHA, AP ;

PRETORIUS, R .

THIN SOLID FILMS, 1982, 93 (1-2) :127-133

[3]

BOTHA AP, 1982, THESIS U STELLENBOSC

[4] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J].

CHU, WK ;

LAU, SS ;

MAYER, JW ;

MULLER, H .

THIN SOLID FILMS, 1975, 25 (02) :393-402

[5] SELF-DIFFUSION IN INTRINSIC AND EXTRINSIC SILICON [J].

FAIRFIEL.JM ;

MASTERS, BJ .

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[6] A XE MARKER STUDY OF THE TRANSFORMATION OF NI2SI TO NISI IN THIN-FILMS [J].

FINSTAD, TG .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 63 (01) :223-228

[7]

FOLL H, 1981, J APPL PHYS, V52, P5110

[8] METHOD FOR DETERMINING SILICON DIFFUSION COEFFICIENTS IN SILICON AND IN SOME SILICON COMPOUNDS [J].

GHOSHTAGORE, RN .

PHYSICAL REVIEW LETTERS, 1966, 16 (20) :890-+

[9]

GOLDSCHMIDT HJ, 1967, INTERSTITIAL ALLOYS, P314

[10]

GUPTA D, 1979, COMMUNICATION

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