DIRECTION OF ELECTROMIGRATION IN THIN SILVER, GOLD, AND COPPER FILMS

被引:44
作者
HUMMEL, RE
BREITLING, RM
机构
关键词
D O I
10.1063/1.1653704
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:373 / +
页数:1
相关论文
共 21 条
[1]   ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS [J].
ATTARDO, MJ ;
ROSENBERG, R .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) :2381-+
[2]   SURFACE TOPOLOGY CHANGES DURING ELECTROMIGRATION IN METALLIC THIN FILM STRIPES [J].
BERENBAUM, L ;
ROSENBERG, R .
THIN SOLID FILMS, 1969, 4 (03) :187-+
[3]   ELECTROMIGRATION IN THIN AL FILMS [J].
BLECH, IA ;
MEIERAN, ES .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) :485-&
[4]  
BREITLING HM, UNPUBLISHED
[5]  
D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108
[6]   EFFECT OF HIGH ELECTRONIC CURRENT DENSITY ON MOTION OF AU195 AND SB125 IN GOLD [J].
GILDER, HM ;
LAZARUS, D .
PHYSICAL REVIEW, 1966, 145 (02) :507-&
[7]   CURRENT-INDUCED MARKER MOTION IN COPPER [J].
GRONE, AR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1961, 20 (1-2) :88-93
[8]   ELECTROMIGRATION IN THIN GOLD FILMS [J].
HARTMAN, TE ;
BLAIR, JC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) :407-&
[9]   ELECTROMIGRATION AND SORET EFFECT IN COBALT [J].
HO, PS .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1966, 27 (08) :1331-&
[10]   ELECTROMIGRATION AND VOID OBSERVATION IN SILVER [J].
HO, PS ;
HUNTINGT.HB .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1966, 27 (08) :1319-&