ADSORPTION OF OXYGEN ON A CLEAN SILICON SURFACE

被引：68

作者：

MEYER, F ^{[1
]}

VRAKKING, JJ ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

SURFACE SCIENCE | 1973年 / 38卷 / 01期

关键词：

D O I：

10.1016/0039-6028(73)90296-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：275 / 281

页数：7

相关论文

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