TITANIUM ISOPROPOXIDE AS A PRECURSOR IN ATOMIC LAYER EPITAXY OF TITANIUM-DIOXIDE THIN-FILMS

被引：268

作者：

RITALA, M

LESKELA, M

NIINISTO, L

HAUSSALO, P

机构：

[1] HELSINKI UNIV TECHNOL,INORGAN & ANALYT CHEM LAB,SF-02150 ESPOO,FINLAND

[2] UNIV HELSINKI,ACCELERATOR LAB,SF-00014 HELSINKI,FINLAND

来源：

CHEMISTRY OF MATERIALS | 1993年 / 5卷 / 08期

关键词：

D O I：

10.1021/cm00032a023

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Atomic layer epitaxy (ALE) deposition of titanium dioxide thin films using titanium isopropoxide and water as precursors was studied. The deposition temperature was limited to below 350-degrees-C by the thermal decomposition of the alkoxide. Films were studied by means of spectrophotometry, XRD, RBS, NRA, SEM, and AFM. A comparison with the ALE process using titanium tetrachloride as a titanium precursor is being carried out.

引用

页码：1174 / 1181

页数：8

共 36 条

[1] THIN-FILMS OF METAL-OXIDES ON SILICON BY CHEMICAL VAPOR-DEPOSITION WITH ORGANOMETALLIC COMPOUNDS .1.
BALOG, M
SCHIEBER, M
MICHMAN, M
PATAI, S
[J]. JOURNAL OF CRYSTAL GROWTH, 1972, 17 (DEC) : 298 - &
[2] Bradley D. C., 1978, METAL ALKOXIDES
[3] THE PYROLYSIS OF METAL ALKOXIDES .2. KINETIC STUDIES ON ZIRCONIUM TETRA-TERT-AMYLOXIDE
BRADLEY, DC
FAKTOR, MM
[J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1959, 55 (12): : 2117 - 2123
[4] METAL ALKOXIDES AS PRECURSORS FOR ELECTRONIC AND CERAMIC MATERIALS
BRADLEY, DC
[J]. CHEMICAL REVIEWS, 1989, 89 (06) : 1317 - 1322
[5] METAL ALKOXIDES AS PRECURSORS FOR THIN-FILM GROWTH
BRADLEY, DC
[J]. PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1990, 330 (1610): : 167 - 171
[6] CHANG YC, 1991, BRIT J IND MED, V48, P12
[7] DORING H, 1992, BER BUNSEN PHYS CHEM, V96, P620
[8] TIO2 FILM PROPERTIES AS A FUNCTION OF PROCESSING TEMPERATURE
FITZGIBBONS, ET
SLADEK, KJ
HARTWIG, WH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (06) : 735 - +
[9] LOW-TEMPERATURE REMOTE PLASMA-ENHANCED DEPOSITION OF THIN METAL-OXIDE FILMS BY DECOMPOSITION OF METAL ALKOXIDES
FRENCK, HJ
OESTERSCHULZE, E
BECKMANN, R
KULISCH, W
KASSING, R
[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 394 - 400
[10] DEPOSITION OF TIO2 THIN-FILMS BY PLASMA-ENHANCED DECOMPOSITION OF TETRAISOPROPYLTITANATE
FRENCK, HJ
KULISCH, W
KUHR, M
KASSING, R
[J]. THIN SOLID FILMS, 1991, 201 (02) : 327 - 335

← 1 2 3 4 →