GRATINGS FOR INTEGRATED OPTICS BY ELECTRON LITHOGRAPHY

被引：16

作者：

TRACY, JC ^{[1
]}

THOMPSON, LF ^{[1
]}

HEIDENREICH, RD ^{[1
]}

MERZ, JL ^{[1
]}

机构：

[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA

来源：

APPLIED OPTICS | 1974年 / 13卷 / 07期

关键词：

D O I：

10.1364/AO.13.001695

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：1695 / 1702

页数：8

相关论文

共 16 条

[1] GRATING COUPLER FOR EFFICIENT EXCITATION OF OPTICAL GUIDED WAVES IN THIN FILMS
DAKSS, ML
KUHN, L
HEIDRICH, PF
SCOTT, BA
[J]. APPLIED PHYSICS LETTERS, 1970, 16 (12) : 523 - +
[2] Dalgoutte D. G., 1973, Optics Communications, V8, P124, DOI 10.1016/0030-4018(73)90152-1
[3] ELECTRON-RESIST FABRICATION OF BENDS AND COUPLERS FOR INTEGRATED OPTICAL CIRCUITS
GOELL, JE
[J]. APPLIED OPTICS, 1973, 12 (04) : 729 - 736
[4] GRAVIN HL, 1973, APPL OPTICS, V12, P455
[5] GREENEICH JS, 1973, 12 S J VAC SCI TECH, V10, P1056
[6] FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS
HEIDENREICH, RD
THOMPSON, LF
FEIT, ED
MELLIARS.CM
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) : 4039 - 4047
[7] KOGELNIK H, 1970, AT&T TECH J, V49, P1620
[8] SIMPLE FLYING SPOT SCANNER DESIGN FOR ELECTRON LITHOGRAPHY
MELLIARSMITH, CM
STORM, AR
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (09) : 1282 - 1285
[9] OGAWA K, 1973, J QUANTUM ELECTRON, VQE9, P29
[10] OPTICAL TECHNIQUE FOR PRODUCING 0.1-MU PERIODIC SURFACE-STRUCTURES
SHANK, CV
SCHMIDT, RV
[J]. APPLIED PHYSICS LETTERS, 1973, 23 (03) : 154 - 155