GENERALIZED MOBILITY LAW FOR DRAIN CURRENT MODELING IN SI MOS-TRANSISTORS FROM LIQUID-HELIUM TO ROOM TEMPERATURES

被引:32
作者
EMRANI, A
BALESTRA, F
GHIBAUDO, G
机构
[1] Laboratoire de Physique des Composants a Semiconducteurs, 38016, Grenoble, France, URA CNRS
关键词
D O I
10.1109/16.199361
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A generalized mobility law for drain current modeling in Si MOSFET's operated in the linear region, which is valid between room and liquid helium temperatures, is presented. It is based on the existence of a power law parameter which allows the linearization of an appropriate function of gate voltage at sufficiently strong inversion Y(V(g)) = (I(d)2/g(m))1/n depending on the drain current and the transconductance of the device. It is demonstrated that a unique value of n can be found for each temperature with a very high precision. This model has been successfully applied to a number of n- and p-channel MOS transistors, and can be used to obtain an accurate extraction of the main device parameters and, therefore, a precise modeling of the transfer characteristics in the whole range of temperature for strong inversion operation.
引用
收藏
页码:564 / 569
页数:6
相关论文
共 11 条
[1]   A COMPREHENSIVE MODEL FOR INVERSION LAYER HOLE MOBILITY FOR SIMULATION OF SUBMICROMETER MOSFETS [J].
AGOSTINELLI, VM ;
SHIN, H ;
TASCH, AF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (01) :151-159
[2]  
EMRANI A, 1993, IN PRESS LOW TEMPERA
[3]   AN ANALYTICAL MODEL OF CONDUCTANCE AND TRANSCONDUCTANCE FOR ENHANCED-MODE MOSFETS [J].
GHIBAUDO, G .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1986, 95 (01) :323-335
[4]   A METHOD FOR MOSFET PARAMETER EXTRACTION AT VERY LOW-TEMPERATURE [J].
GHIBAUDO, G ;
BALESTRA, F .
SOLID-STATE ELECTRONICS, 1989, 32 (03) :221-223
[5]   NEW METHOD FOR THE EXTRACTION OF MOSFET PARAMETERS [J].
GHIBAUDO, G .
ELECTRONICS LETTERS, 1988, 24 (09) :543-545
[6]   MODELING OF ELECTRON-MOBILITY IN SILICON MOS INVERSION AND ACCUMULATION LAYERS AT LIQUID-HELIUM TEMPERATURE [J].
HAFEZ, IM ;
EMRANI, A ;
GHIBAUDO, G ;
BALESTRA, F .
ELECTRONICS LETTERS, 1990, 26 (19) :1633-1634
[7]   CHARACTERIZATION AND MODELING OF SILICON METAL-OXIDE-SEMICONDUCTOR TRANSISTORS AT LIQUID-HELIUM TEMPERATURE - INFLUENCE OF SOURCE-DRAIN SERIES RESISTANCES [J].
HAFEZ, IM ;
BALESTRA, F ;
GHIBAUDO, G .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (07) :3694-3700
[8]   INVERSION LAYER MOBILITY UNDER HIGH NORMAL FIELD IN NITRIDED-OXIDE MOSFETS [J].
HORI, T .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (09) :2058-2069
[9]   MEASUREMENTS AND MODELING OF THE N-CHANNEL MOSFET INVERSION LAYER MOBILITY AND DEVICE CHARACTERISTICS IN THE TEMPERATURE-RANGE 60-300 K [J].
HUANG, CL ;
GILDENBLAT, GS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (05) :1289-1300
[10]  
MULLER RS, 1986, DEVICE ELECTRONICS I