SPUTTERING YIELDS FOR LIGHT-IONS AS A FUNCTION OF ANGLE OF INCIDENCE

The sputtering yield of Ni, Mo, and Au have been measured at oblique angles of incidence for H+-, D+-, and4He+-ion irradiation in the energy region from 1 to 8 keV. The yields were determined from the weight loss of the targets. For Ni and Mo the dependence of the sputtering yield on the angle of incidence was found to be much stronger for H+- and D+-ion than for4He+-ion irradiation. In all cases the maximum in the yield was found at angles of incidence θ{symbol}≧80°, where θ{symbol} is the angle measured from the surface normal. Furthermore the ratio of the maximum yield to the yeild at normal incidence increases with increasing surface binding energy of the target material as well as with increasing ion energy in the energy region inveestigated. The results are discussed qualitatively in view of a model for the sputtering mechanism for light ions. © 1979 Springer-Verlag.