Azo-group-containing polymers for use in communications technologies

被引:90
作者
Nuyken, O
Scherer, C
Baindl, A
Brenner, AR
Dahn, U
Gartner, R
KaiserRohrich, S
Kollefrath, R
Matusche, P
Voit, B
机构
[1] Lehrst. fur Makromolekulare Stoffe, TU München, 85747 Garching
关键词
D O I
10.1016/S0079-6700(96)00020-2
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
[No abstract available]
引用
收藏
页码:93 / 183
页数:91
相关论文
共 217 条
[31]  
Delzenne G.A., 1979, ADV PHOTOCHEM, V11, P1
[32]  
Dessauer J. H., 1965, XEROGRAPHY RELATED P
[33]   SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].
DEUTSCH, TF ;
GEIS, MW .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204
[34]   THE DEVELOPMENT AND USE OF QUANTUM-MECHANICAL MOLECULAR-MODELS .76. AM1 - A NEW GENERAL-PURPOSE QUANTUM-MECHANICAL MOLECULAR-MODEL [J].
DEWAR, MJS ;
ZOEBISCH, EG ;
HEALY, EF ;
STEWART, JJP .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (13) :3902-3909
[35]  
DICKE HR, 1981, MAKROMOL CHEM-RAPID, V2, P83
[36]   EVIDENCE FOR THE THERMAL NATURE OF LASER-INDUCED POLYMER ABLATION [J].
DIJKKAMP, D ;
GOZDZ, AS ;
VENKATESAN, T ;
WU, XD .
PHYSICAL REVIEW LETTERS, 1987, 58 (20) :2142-2145
[37]  
DIJKSTRA R, 1958, RECL TRAV CHIM PAY B, V77, P538
[38]   A new synthesis of diazoamino-compounds 4 Memorandum on syntheses with azide [J].
Dimroth, O .
BERICHTE DER DEUTSCHEN CHEMISCHEN GESELLSCHAFT, 1905, 38 :670-688
[39]  
DINABURG MS, 1964, PHOTOSENSITIVE DIAZO
[40]   NANOSECOND PHOTOACOUSTIC STUDIES ON ULTRAVIOLET-LASER ABLATION OF ORGANIC POLYMERS [J].
DYER, PE ;
SRINIVASAN, R .
APPLIED PHYSICS LETTERS, 1986, 48 (06) :445-447