Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

被引：36

作者：

Pati, GS ^{[1
]}

Heilmann, RK ^{[1
]}

Konkola, PT ^{[1
]}

Joo, C ^{[1
]}

Chen, CG ^{[1
]}

Murphy, E ^{[1
]}

Schattenburg, ML ^{[1
]}

机构：

[1] MIT, Ctr Space Res, Space Nanotechnol Lab, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 06期

关键词：

D O I：

10.1116/1.1520563

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate a versatile interference lithography system that can continuously vary the pattern period and orientation during fabrication of general periodic structures in one or two dimensions. Initial experimental results, using closed-loop beam steering control and double exposures on a stationary substrate, are obtained in order to illustrate its principle of operation. A fringe-locking scheme for phase control is also demonstrated including discussion of issues related to future system developments. (C) 2002 American Vacuum Society.

引用

页码：2617 / 2621

页数：5

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