Adsorption porosimetry application in the study of a porous structure of thin layers

The method of adsorption porosimetry (AP) has been long known in physical chemistry of porous sorbents, but its practical application was limited to studies of massive samples of such materials as silica gels, zeolites, etc. We have developed a technique to study the porous structure of dielectric thin films (d similar to 100 nm). It is stated that it provides us with quite novel information which permits the prediction of properties of dielectric layers and makes it possible on this basis to solve optimization problems of technological processes. The use of ellipsometry has further extended the potential of this method, and currently it is a powerful nondestructive technique to measure porosity and the size distribution of pores in thin layers for the purposes of modem electronics.