Characterization of sol-gel prepared WO3 thin films as a gas sensor

被引:48
作者
Cantalini, C [1 ]
Atashbar, MZ
Li, Y
Ghantasala, MK
Santucci, S
Wlodarski, W
Passacantando, M
机构
[1] Dept Chem & Mat, Laquila, Italy
[2] RMIT Univ, Dept Commun & Elect Engn, Melbourne, Vic 3001, Australia
[3] RMIT Univ, Dept Elect Engn, Melbourne, Vic 3001, Australia
[4] Dept Phys, Laquila, Italy
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1999年 / 17卷 / 04期
关键词
D O I
10.1116/1.581698
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tungsten trioxide (WO3) thin films have been prepared by the sol-gel process and annealed at different temperatures of 400, 500, 600, and 700 degrees C for 1 h. The morphology, microstructure crystalline structure, and composition of the films have been analyzed using scanning electron microscopy (SEM), x-ray diffraction, Rutherford backscattering spectroscopy (RBS), and x-ray photoelectron spectroscopy (XPS) techniques. The SEM analysis showed that the films annealed at 400 degrees C are smooth and uniform. However, these evolved as granular at an annealing temperature of 500 degrees C. The films annealed at still higher temperatures have two distinct grains of different shapes and sizes. The films annealed below 400 degrees C are amorphous. Annealing at 500 degrees C resulted in the films having polycrystalline structure. RES and XPS characterization have revealed that the films annealed at 400 degrees C are stoichiometric. Annealing above this temperature resulted in the films becoming off-stoichiometric. The electrical resistance of the films annealed at 500 degrees C increased 18 times when exposed to 175 ppb O-3 gas compared to the air exposure, with the response time being as short as 1-2 min. (C) 1999 American Vacuum Society. [S0734-2101(99)08804-1].
引用
收藏
页码:1873 / 1879
页数:7
相关论文
共 18 条
  • [11] Moulder J.F., 1995, HDB XRAY PHOTOELECTR
  • [12] SAW NOx gas sensor using WO3 thin-film sensitive coating
    Penza, M
    Vasanelli, L
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 1997, 41 (1-3) : 31 - 36
  • [13] SCHAEFER DW, 1984, MATER RES SOC S P, V32, P1
  • [14] PROTOTYPE STRUCTURE FOR SYSTEMATIC INVESTIGATIONS OF THIN-FILM GAS SENSORS
    SCHIERBAUM, KD
    VAIHINGER, S
    GOPEL, W
    VANDENVLEKKERT, HH
    KLOECK, B
    DEROOIJ, NF
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 1990, 1 (1-6) : 171 - 175
  • [15] Microstructural effect on NO2 sensitivity of WO3 thin film gas sensors .1. Thin film devices, sensors and actuators
    Sun, HT
    Cantalini, C
    Lozzi, L
    Passacantando, M
    Santucci, S
    Pelino, M
    [J]. THIN SOLID FILMS, 1996, 287 (1-2) : 258 - 265
  • [16] HIGHLY SENSITIVE OZONE SENSOR
    TAKADA, T
    SUZUKI, K
    NAKANE, M
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 1993, 13 (1-3) : 404 - 407
  • [17] Optical indices of electrochromic tungsten oxide
    vonRottkay, K
    Rubin, M
    Wen, SJ
    [J]. THIN SOLID FILMS, 1997, 306 (01) : 10 - 16
  • [18] YAMAGUCHI O, 1987, COMMUN AM CER SOC, V70, pC94