TEM investigation of alpha alumina films deposited at low temperature

被引：20

作者：

Cloud, A. N. ^{[1
]}

Canovic, S. ^{[2
]}

Abu-Safe, H. H. ^{[1
]}

Gordon, M. H. ^{[1
]}

Halvarsson, M. ^{[2
]}

机构：

[1] Univ Arkansas, Fayetteville, AR 72701 USA

[2] Chalmers Univ Technol, SE-41296 Gothenburg, Sweden

来源：

SURFACE & COATINGS TECHNOLOGY | 2008年 / 203卷 / 5-7期

关键词：

Alpha alumina; Tool coating; Magnetron sputtering;

D O I：

10.1016/j.surfcoat.2008.05.034

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

Alpha-phase aluminum oxide thin films were deposited at 480 degrees C by AC inverted cylindrical magnetron sputtering on nickel coated transmission electron microscopy (TEM) grids and stainless steel substrates. Several previous studies have demonstrated that an alpha phase was possible at low temperature if a chromium template layer was present. However, here we show that alpha phase is possible without the chromium oxide layer. The presence of alpha phase alumina has been confirmed by TEM. Cross-sectional TEM observations have indicated deposition rates as high as 270 nm/h. This intriguing result is attributed to the unique characteristics of the sputtering system which provides more energetic species at the substrate. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：808 / 811

页数：4

共 20 条

[1]

Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers [J].