Individual GaAs nanorods imaged by coherent X-ray diffraction

被引:25
作者
Biermanns, Andreas [1 ]
Davydok, Anton [1 ]
Paetzelt, Hendrik [2 ,3 ]
Diaz, Ana [4 ]
Gottschalch, Volker [3 ]
Metzger, Till Hartmut [4 ]
Pietsch, Ullrich [1 ]
机构
[1] Univ Siegen, Solid State Phys Grp, D-57068 Siegen, Germany
[2] Leibniz Inst Surface Modificat, Ion Beam Technol Dept, D-04318 Leipzig, Germany
[3] Univ Leipzig, Semicond Chem Grp, D-04103 Leipzig, Germany
[4] European Synchrotron Radiat Facil, F-38043 Grenoble, France
关键词
X-ray diffraction; coherent diffraction imaging; semiconductor nanorods; phase-retrieval analysis; EPITAXIAL-GROWTH; INAS NANOWIRES; PHASE;
D O I
10.1107/S0909049509032889
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Using scanning X-ray diffraction microscopy with a spot size of 220 x 600 nm, it was possible to inspect individual GaAs nanorods grown seed-free through circular openings in a SiNx mask in a periodic array with 3 mu m spacing on GaAs[111]B. The focused X-ray beam allows the determination of the strain state of individual rods and, in combination with coherent diffraction imaging, it was also possible to characterize morphological details. Rods grown either in the centre or at the edge of the array show significant differences in shape, size and strain state.
引用
收藏
页码:796 / 802
页数:7
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