Room-temperature evolution of vacancy-type damage created by 2 keV B+ implantation of Si

被引:2
作者
Gwilliam, RM [1 ]
Knights, AP
Burrows, CP
Coleman, PG
机构
[1] Univ Surrey, Sch Elect Comp & Math, Surrey Ctr Res Ion Beam Applicat, Guildford GU2 5XH, Surrey, England
[2] Univ Bath, Dept Phys, Bath BA2 7AY, Avon, England
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 01期
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1116/1.1447249
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Beam-based positron annihilation spectroscopy has been applied to the study of near-surface vacancies created by 2 keV B+ ions implanted into Cz Si. The use of a controllable-energy positron beam means that the probe can be tuned to maximize the response to the subsurface damage. Time-dependent changes have been observed in the near-surface vacancy concentration profile. For example, after one week at room temperature, exposure of an implanted sample to white light for 1 h resulted in the migration of similar to95% of the measurable damage to sinks-primarily, it is assumed, to the surface. The relative importance of temperature, air, and light has been investigated. (C) 2002 American Vacuum Society.
引用
收藏
页码:427 / 430
页数:4
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