Schottky barrier tuning at Al/GaAs(100) junctions

被引:25
作者
Berthod, C
Bardi, J
Binggeli, N
Baldereschi, A
机构
[1] Institut de Physique Appliquée, Ecole Polytechnique Fédérale de Lausanne
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 04期
关键词
D O I
10.1116/1.588949
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using an ab initio pseudopotential approach, we have investigated the electronic structure of ideal Al/GaAs(100) and Al/Ga1-xAlxAs(100) junctions, and the change of the corresponding Schottky barrier height versus the alloy composition x and in the presence of ultrathin group-IV atom interlayers. We find large changes in the Schottky barrier height which agree well with the experimental data. In order to interpret the observed trends we have analyzed the charge density response to chemical substitutions near the junction. This allowed us to extend to metal/semiconductor interfaces a microscopic linear-response theory approach previously employed to interpret band-offset trends at semiconductor heterojunctions. (C) 1996 American Vacuum Society.
引用
收藏
页码:3000 / 3007
页数:8
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