Mapping the spatial distribution of charge carriers in LaAlO3/SrTiO3 heterostructures

被引:363
作者
Basletic, M. [1 ]
Maurice, J. -L. [1 ]
Carretero, C. [1 ]
Herranz, G. [1 ]
Copie, O. [1 ]
Bibes, M. [1 ]
Jacquet, E. [1 ]
Bouzehouane, K. [1 ]
Fusil, S. [1 ]
Barthelemy, A. [1 ]
机构
[1] Univ Paris Sud, CNRS Thales, Unite Mixte Phys, F-91767 Palaiseau, France
关键词
D O I
10.1038/nmat2223
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
At the interface between complex insulating oxides, novel phases with interesting properties may occur, such as the metallic state reported in the LaAlO(3)/SrTiO(3) system(1). Although this state has been predicted(2) and reported(3,4) to be confined at the interface, some studies indicate a much broader spatial extension(5), thereby questioning its origin. Here, we provide for the first time a direct determination of the carrier density profile of this system through resistance profile mappings collected in cross-section LaAlO(3)/SrTiO(3) samples with a conducting-tip atomic force microscope (CT-AFM). We find that, depending on specific growth protocols, the spatial extension of the high-mobility electron gas can be varied from hundreds of micrometres into SrTiO(3) to a few nanometres next to the LaAlO(3)/SrTiO(3) interface. Our results emphasize the potential of CT-AFM as a novel tool to characterize complex oxide interfaces and provide us with a definitive and conclusive way to reconcile the body of experimental data in this system.
引用
收藏
页码:621 / 625
页数:5
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