Optical transitions in Pr-implanted GaN

被引:30
作者
Zavada, JM [1 ]
Mair, RA
Ellis, CJ
Lin, JY
Jiang, HX
Wilson, RG
Grudowski, PA
Dupuis, RD
机构
[1] USA, European Res Off, London NW1 5TH, England
[2] Kansas State Univ, Dept Phys, Manhattan, KS 66506 USA
[3] Univ Texas, Austin, TX 78712 USA
关键词
D O I
10.1063/1.124514
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence (PL) spectroscopy has been used to investigate praseodymium (Pr) related transitions in Pr-implanted GaN. Wurtzite GaN epilayers were grown by metalorganic chemical vapor deposition on sapphire substrates and subsequently ion implanted with Pr to a dose of 5.7x10(13)/cm(2). The implanted samples were annealed in nitrogen to facilitate recovery from implantation related damage. Narrow PL emission bands related to 4f intrashell transitions of the trivalent Pr ion were observed near 650, 950, 1100, and 1300 nm. The dependence of PL emission on sample temperature, excitation intensity, oxygen incorporation, and annealing temperature was systematically studied. We find that the PL efficiency increases exponentially with annealing temperature up to the maximum temperature of 1050 degrees C applied in the current study. Furthermore, the PL emission shows no evidence of significant thermal quenching over the sample temperature range of 10-300 K. This thermal stability will have particular advantages for applications in high temperature optoelectronic devices. (C) 1999 American Institute of Physics. [S0003-6951(99)01732-5].
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页码:790 / 792
页数:3
相关论文
共 18 条
[1]   Red light emission by photoluminescence and electroluminescence from Pr-doped GaN on Si substrates [J].
Birkhahn, R ;
Garter, M ;
Steckl, AJ .
APPLIED PHYSICS LETTERS, 1999, 74 (15) :2161-2163
[2]   Room-temperature visible and infrared photoluminescence from Pr-implanted GaN films by focused-ion-beam direct write [J].
Chao, LC ;
Steckl, AJ .
APPLIED PHYSICS LETTERS, 1999, 74 (16) :2364-2366
[3]   Epitaxial growth of III-V nitride semiconductors by metalorganic chemical vapor deposition [J].
Dupuis, RD .
JOURNAL OF CRYSTAL GROWTH, 1997, 178 (1-2) :56-73
[4]   1.54-MU-M LUMINESCENCE OF ERBIUM-IMPLANTED III-V SEMICONDUCTORS AND SILICON [J].
ENNEN, H ;
SCHNEIDER, J ;
POMRENKE, G ;
AXMANN, A .
APPLIED PHYSICS LETTERS, 1983, 43 (10) :943-945
[5]   PHOTOLUMINESCENCE SPECTRA OF TRIVALENT PRASEODYMIUM IMPLANTED IN SEMIINSULATING GAAS [J].
ERICKSON, LE ;
AKANO, U ;
MITCHELL, I ;
ROWELL, N ;
WANG, A .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (04) :2347-2353
[6]   LUMINESCENCE OF ERBIUM IMPLANTED IN VARIOUS SEMICONDUCTORS - IV-MATERIALS, III-V-MATERIALS AND II-VI MATERIALS [J].
FAVENNEC, PN ;
LHARIDON, H ;
SALVI, M ;
MOUTONNET, D ;
LEGUILLOU, Y .
ELECTRONICS LETTERS, 1989, 25 (11) :718-719
[7]  
GIPPIUS AA, 1986, MATER SCI FORUM, V10, P1195
[8]   Photoluminescence of erbium-implanted GaN and in situ-doped GaN:Er [J].
Hansen, DM ;
Zhang, R ;
Perkins, NR ;
Safvi, S ;
Zhang, L ;
Bray, KL ;
Kuech, TF .
APPLIED PHYSICS LETTERS, 1998, 72 (10) :1244-1246
[9]  
HOMMERICH U, 1999, MRS INTERNET J NITRI, V41
[10]  
Kaminskii A.A., 1981, Laser Crystals